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Pentakis(dimethylamino) tantalum (PDMAT)

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Pentakis(dimethylamino) tantalum, PDMAT is a soild tantalum precursor for TaN barrier layers to prevent copper diffusion in semiconductor application.

Product Details

Pentakis(dimethylamino) tantalum is an organometallic compound with the chemical formula Ta (N (CH3) 2) 5. It is a complex with a metal organic bridge bond, formed by five dimethylamino (N (CH3) 2) ligands and a tantalum atom. PDMAT is an important precursor material that can be used to prepare materials such as tantalum metal, tantalum nitride, and tantalum nitride thin films.

chemical property

PDMAT is a colorless to yellow solid with a crystal structure belonging to the orthorhombic crystal system. It is soluble in many organic solvents such as toluene, benzene, xylene, etc., but insoluble in water. PDMAT is a very stable compound that can be stored at room temperature for several years without decomposition. It has good thermal stability and hardly decomposes at high temperatures. PDMAT has a certain vapor pressure and can evaporate at room temperature.

Common uses

Used for ALD/MOCVD, preparing thin films such as Ta2O5 and TaNx, widely used in the field of microelectronics such as copper diffusion barrier layer, capacitor, memory, energy battery, photocatalysis, etc.

 

Product specification

(5N) 99.999% 

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