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Dichlorosilane (DCS)

DCS
Dichlorosilane can be used as high quality semiconductor silicon source material for chemical vapor deposition (CVD) process and silicon epitaxial chip growth process. In the semiconductor industry, dichlorosilane can be used as a reaction gas to produce silicon atoms and deposit silicon atoms on the substrate to produce silicon epitaxial sheets.

Product Details

What is Dichlorosilane?

Dichlorosilane, chemical formula Cl2H2Si, molecular weight 101.01, is a colorless, flammable, toxic, and volatile liquid with a pungent odor. In the air, dichlorosilane is highly flammable and even explosive, and its vapor can form an explosive mixture with the air. It will react violently with water, generating hydrochloric acid mist. Dichlorosilane is an important semiconductor material, commonly used in the preparation of semiconductor epitaxial materials and chemical vapor deposition as a gas source. In industry, dichlorosilane can be prepared by reacting silicon with hydrochloric acid vapor or tetrachlorosilane with formaldehyde. However, dichlorosilane poses a high risk and is a highly toxic chemical, requiring special attention to safety when used.

Electronic grade dichlorosilane (DCS) is an important silicon source gas in semiconductor industry, which has the characteristics of fast deposition rate, uniform deposition film and low precipitation temperature. It is mainly used for epitaxial growth and chemical vapor deposition of silica and silicon nitride. In advanced processes below 28nm, DCS has completely replaced silane and trichlorosilane as the mainstream silicon source.

With the advancement of technology and the rapid development of the semiconductor industry, the demand for high-quality semiconductor materials is also constantly increasing. As a high-quality semiconductor silicon source material, the demand for dichlorosilane will also increase. Especially driven by emerging technologies such as 5G, the Internet of Things, and artificial intelligence, the demand for semiconductors will further increase.
Terminal application field: The application of dichlorosilane in the semiconductor industry is mainly concentrated in fields such as organic silicon polymers, and the demand for these fields is also constantly increasing. For example, in the emerging fields of electric vehicles and renewable energy, the demand for semiconductors will further increase, which will also bring more application opportunities for dichlorosilane.
Regional development: The global semiconductor market is mainly distributed in North America, Europe, and the Asia Pacific region, and the market size of dichlorosilane in these regions is also constantly expanding. Especially in the Asia Pacific region, it has become the world’s largest semiconductor market, which will also bring more application opportunities for dichlorosilane.

Packaging specifications: 40L stainless steel cylinder filling 37KG, 450L stainless steel cylinder filling 400KG,Valve model DISS636.

Purity: 99.99%,The main purpose of this specification product is semiconductor production. It can be mixed with ammonia in a chemical vapor deposition chamber to grow silicon nitride thin films.

The DCS produced by our company mainly comes from by-products of polycrystalline silicon factories, which have excellent cost advantages. At the same time, we supply to leading semiconductor companies such as TSMC and SMIC International, and the quality has been verified and is very stable.

Storage condition reminder

Storage precautions: Store in a cool and ventilated dedicated warehouse for toxic gases. The temperature of the warehouse should not exceed 30 ℃. Keep away from sparks and heat sources. The packaging must be sealed and protected from moisture. It should be stored separately from oxidants, alkalis, alcohols, and edible chemicals, and mixed storage should be avoided. Using explosion-proof lighting and ventilation facilities. Prohibit the use of mechanical equipment and tools that are prone to sparks. The storage area should be equipped with emergency response equipment for leaks.

 

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